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Proceedings Paper

VUV spectrophotometry for photomasks characterization at 193 nm
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Paper Abstract

This paper intends to develop a measurement system to characterize photomasks for 193 nm lithography applications. Based on the VUV spectrophotometer at the Fraunhofer IOF institute, some modifications have been addressed to fulfil these special measurements. Characterizations on photomasks have been successfully carried out, which show good correlations to simulations.

Paper Details

Date Published: 20 October 2005
PDF: 7 pages
Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 59651L (20 October 2005); doi: 10.1117/12.625144
Show Author Affiliations
Minghong Yang, Fraunhofer-Institut für Optik und Feinmechanik (Germany)
Jork Leiterer, Fraunhofer-Institut für Optik und Feinmechanik (Germany)
Alexandre Gatto, Fraunhofer-Institut für Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer-Institut für Optik und Feinmechanik (Germany)
Ingo Höllein, Advanced Mask Technology Ctr. GmbH and Co. KG (Germany)
Silvio Teuber, Advanced Mask Technology Ctr. GmbH and Co. KG (Germany)
Karsten Bubke, Advanced Mask Technology Ctr. GmbH and Co. KG (Germany)


Published in SPIE Proceedings Vol. 5965:
Optical Fabrication, Testing, and Metrology II
Angela Duparré; Roland Geyl; Lingli Wang, Editor(s)

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