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Proceedings Paper

Performances and stability of Sc/Si multilayers with barrier layers for wavelengths around 46 nm
Author(s): Julien Gautier; Franck Delmotte; Marc Roulliay; Marie-Francoise Ravet; Francoise Bridou; Arnaud Jerome; Angelo Giglia; Stefano Nannarone
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Paper Abstract

We present an experimental study of aging and thermal stability of Sc/Si multilayers deposited by magnetron sputtering. These multilayers have been characterized by using hard X-ray grazing incidence reflectometry at 0.154 nm and synchrotron radiation reflectometry at near normal incidence. The reflectivity was found to be stable after one year. A maximum reflectivity of 46% has been measured at 46 nm. However a 20% relative decrease of the reflectivity have been observed after one hour thermal annealing at 200°C. In order to improve thermal stability, we studied two different barriers layers (B4C and ScN ). We compare the decrease of peak reflectivity and its wavelength shift after one hour annealing at 200°C under argon atmosphere. The best result was observed with the design using 0.3 nm B4C barrier layers. A relative decrease of 2% of the reflectivity peak has been observed with this design as compared to a 20% decrease without barrier layers.

Paper Details

Date Published: 5 October 2005
PDF: 8 pages
Proc. SPIE 5963, Advances in Optical Thin Films II, 59630X (5 October 2005); doi: 10.1117/12.625030
Show Author Affiliations
Julien Gautier, Lab. Charles Fabry de l'Institut d'Optique, CNRS (France)
Franck Delmotte, Lab. Charles Fabry de l'Institut d'Optique, CNRS (France)
Marc Roulliay, Lab. Charles Fabry de l'Institut d'Optique, CNRS (France)
Marie-Francoise Ravet, Lab. Charles Fabry de l'Institut d'Optique, CNRS (France)
Francoise Bridou, Lab. Charles Fabry de l'Institut d'Optique, CNRS (France)
Arnaud Jerome, Lab. Charles Fabry de l'Institut d'Optique, CNRS (France)
Angelo Giglia, BEAR Beamline Lab. TASC-INFM (Italy)
Stefano Nannarone, BEAR Beamline Lab. TASC-INFM (Italy)


Published in SPIE Proceedings Vol. 5963:
Advances in Optical Thin Films II
Claude Amra; Norbert Kaiser; H. Angus Macleod, Editor(s)

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