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Proceedings Paper

Technology-oriented stochastic optimization of radially symmetric DOEs
Author(s): V. S. Pavelyev
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Paper Abstract

With enhanced performance of computing facilities the iterative design of phase diffractive elements (DOEs) has become widely accepted. A great number of up-to-date technologies for DOE fabrication make use of the approximation of the commonly continous DOE phase function by a picewise continuos (quantized) function. This is the reason why constructing iterative procedures for the design of quantized DOEs (DOEs with quiantized phase function) has become topical. Designing quantized DOEs with small number of quantization levels using Fienup-type iterative algorithms (or IFTA-algorithms) is hampered by the necessity to solve the diffractive theory inverse problem at every iteration. Besides, using of such algorithms cannot guarantee convergence to global optimum. The use of stochastic procedures does not make it necessary to solve the inverse problem. Thus, the DOE phase function may be sought for directly over a set of "technologically implemented functions," allowing the quantization errors to be avoided. Such approach can be used also in the case of another restrictions (restriction on the etching depth value, etc.) However, constructing a stochastic optimization procedure for a real DOE calls for solving a great number of direct problems, which in general may result in an unpractical coputational efforts. It seems worthwhile to consider how the stochastic DOE phase optimization can be used when solving the direct problem does not require great computational effort (e.g. for a radially symmetric DOE). This paper deals with application of the known genetic stochastic procedure to determine the optimum of the function of many variables to designing quantized DOEs focusing light into radially symmetric focal domains (focusing into a circle or flat-top). Computer simulation results are presented.

Paper Details

Date Published: 14 October 2005
PDF: 7 pages
Proc. SPIE 5962, Optical Design and Engineering II, 596230 (14 October 2005); doi: 10.1117/12.625005
Show Author Affiliations
V. S. Pavelyev, Image Processing Systems Institute, RAS (Russia)


Published in SPIE Proceedings Vol. 5962:
Optical Design and Engineering II
Laurent Mazuray; Rolf Wartmann, Editor(s)

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