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Proceedings Paper

Optical design, manufacturing, and tests of the MUSE image slicer
Author(s): Florence Laurent; Edgard Renault; Roland Bacon; Jean-Pierre Dubois; François Hénault; Daniel Robert
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Paper Abstract

MUSE (Multi Unit Spectroscopic Explorer) is a second generation integral field spectrograph proposed to the European Southern Observatory (ESO) for the VLT. MUSE combines a 1' x 1' Field of View (FoV) with a spectral resolution going to 3000 and a spatial resolution of 0.2" provided by the GALACSI adaptive optics system. MUSE is operating in the visible and near IR wavelength range (0.465-0.93 μm). It is composed of 24 identical integral field units; each one incorporates an advanced image slicer made of a combination of mirrors and mini-lenses arrays. During the feasibility study, a slicer prototype has been designed, manufactured and tested. This paper firstly describes an original approach for the slicer optical design and manufacturing. Then, we will focus on the optical tests of the prototype. These tests included the control of the angular tilts and assembling method of the slicer, the measurements of the position, size and shape of the pseudo-slits, the measurements of the Point Spread Function (PSF) for the slice-slit imagery on the whole FoV and an estimation of the size of the global exit pupil. We finally conclude on the feasibility of MUSE image slicer and its possible improvement for the next design phase.

Paper Details

Date Published: 20 October 2005
PDF: 12 pages
Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 59650J (20 October 2005); doi: 10.1117/12.624836
Show Author Affiliations
Florence Laurent, CRAL Observatoire de Lyon (France)
CYBERNETIX SA (France)
Edgard Renault, CRAL Observatoire de Lyon (France)
Roland Bacon, CRAL Observatoire de Lyon (France)
Jean-Pierre Dubois, CRAL Observatoire de Lyon (France)
François Hénault, CRAL Observatoire de Lyon (France)
Daniel Robert, CRAL Observatoire de Lyon (France)


Published in SPIE Proceedings Vol. 5965:
Optical Fabrication, Testing, and Metrology II
Angela Duparré; Roland Geyl; Lingli Wang, Editor(s)

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