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Proceedings Paper

Comparative study of IR and UV laser damage resistance of silica thin films deposited by Electron Beam deposition, Ion Plating, Ion Assisted Deposition and Dual Ion Beam Sputtering
Author(s): Laurent Gallais; Hélène Krol; Jérémie Capoulade; Michel Cathelinaud; Luc Roussel; Gérard Albrand; Jean-Yves Natoli; Mireille Commandré; Michel Lequime; Claude Amra
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Paper Abstract

The laser damage resistance of optical coatings is a critical point for a large number of applications. However improving this resistance is often hard to obtain because of the large number of parameters in the deposition processes than can modify the laser damage threshold and the lack of detailed and exploitable studies published on this subject. Then, the aim of this work is to test and analyze the laser damage resistance of a usual material for high power applications (silica) deposited in various conditions. The thin films of different thicknesses were specially deposited using different techniques available at the Institut Fresnel: Dual Ion Beam Sputtering, Electron Beam Deposition, Ion Assisted Deposition and Ion Plating. The laser-induced damage thresholds of these coatings were determined at 1064nm and 355nm using nanosecond pulsed YAG lasers, with a 1-on-1 test procedure. Other diagnostic tools were used to complete the study and make potential correlations with laser damage: photothermal techniques, luminescence spectrocopy, optical profilometry, dark field and Nomarski microscopy. The comparative study of these results highlight different laser damage behaviors of the silica coatings that we correlate to the density and the nature of the defects.

Paper Details

Date Published: 4 October 2005
PDF: 7 pages
Proc. SPIE 5963, Advances in Optical Thin Films II, 59630Z (4 October 2005); doi: 10.1117/12.624643
Show Author Affiliations
Laurent Gallais, Institut Fresnel (France)
Hélène Krol, Institut Fresnel (France)
Jérémie Capoulade, Institut Fresnel (France)
Michel Cathelinaud, Institut Fresnel (France)
Luc Roussel, Institut Fresnel (France)
Gérard Albrand, Institut Fresnel (France)
Jean-Yves Natoli, Institut Fresnel (France)
Mireille Commandré, Institut Fresnel (France)
Michel Lequime, Institut Fresnel (France)
Claude Amra, Institut Fresnel (France)


Published in SPIE Proceedings Vol. 5963:
Advances in Optical Thin Films II
Claude Amra; Norbert Kaiser; H. Angus Macleod, Editor(s)

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