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Proceedings Paper

Ultra-high-resolution DUV microscope optics for semiconductor applications
Author(s): Wolfgang Vollrath
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Paper Abstract

When looking into even modern textbooks on optical design and engineering one can get the impression that everything has already been said about microscope optics. Also at optical conferences microscope optics is at most a marginal topic. Because of this only insiders are aware about the exciting challenges and really amazing achievements in today's state-of-the-art microscope optics. To give an example, this paper will focus on ultra-high resolution DUV microscope objectives for semiconductor inspection and metrology with feature size (half pitch) resolution down to about 60 nm. To meet the performance requirements of such objectives all aspects of optical design and tolerancing, optical coating design, optical production, assembly and image performance assessment have to be matched perfectly to each other at the highest technological level.

Paper Details

Date Published: 19 August 2005
PDF: 9 pages
Proc. SPIE 5865, Tribute to Warren Smith: A Legacy in Lens Design and Optical Engineering, 58650E (19 August 2005); doi: 10.1117/12.624560
Show Author Affiliations
Wolfgang Vollrath, Leica Microsystems AG (Germany)

Published in SPIE Proceedings Vol. 5865:
Tribute to Warren Smith: A Legacy in Lens Design and Optical Engineering
Robert E. Fischer, Editor(s)

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