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Proceedings Paper

Nanostructure and optical properties of fluoride films for high-quality DUV/VUV optical components
Author(s): Sven Schröder; Hein Uhlig; Angela Duparré; Norbert Kaiser
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Paper Abstract

The persistent utilization of optical lithography at the DUV and VUV excimer laser wavelengths leads to extraordinary demands on the optical components involved (high throughput, low scattering, high mechanical stability, ...). Fluorides are the main or even the only candidates for film materials in these spectral regions because of their low absorption. There are several high-index and low-index fluoride materials. These materials, however, may significantly differ in their nanostructural properties leading to scatter losses crucially influencing the performance of the multilayers. In order to find optimal material combinations, HR multilayer mirrors were fabricated using several high-index fluoride film materials. Spectral photometry, atomic force microscopy, as well as total and angle resolved light scattering measurement and analysis were performed for comprehensive characterization.

Paper Details

Date Published: 4 October 2005
PDF: 10 pages
Proc. SPIE 5963, Advances in Optical Thin Films II, 59630R (4 October 2005); doi: 10.1117/12.624499
Show Author Affiliations
Sven Schröder, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Hein Uhlig, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Angela Duparré, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 5963:
Advances in Optical Thin Films II
Claude Amra; Norbert Kaiser; H. Angus Macleod, Editor(s)

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