Share Email Print
cover

Proceedings Paper

Scanning force microscopy for optical surface metrology
Author(s): M. Flemming; K. Roder; A. Duparré
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Surface structures with lateral dimensions in the nanometer range (⪅ 100 nm) have a significant impact on the optical and functional surface properties. Scanning Force Microscopy (SFM) has been increasingly used to investigate the nanotopography of substrates and thin films. SFM data evaluation is nevertheless so far mainly restricted to qualitative image information or single roughness parameters. Appropriate description of statistical surface roughness needs an advanced quantitative data analysis, which can be accomplished by Power Spectral Density (PSD) functions. For nanostructures conclusions about the information content of measurement results are difficult and only possible in a qualified manner. The results can be strongly influenced by the geometry of the probe tip, whose lateral dimension is in the nanometer range too. Based on experimental/empirical work, we estimated tip size effects on the PSDs of thin films. Especially the SFM measurement of super smooth samples (e.g. substrates for EUV coatings) can also be affected by inherent noise of the system. We therefore also present and discuss methods of noise analysis.

Paper Details

Date Published: 19 October 2005
PDF: 10 pages
Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 59650A (19 October 2005); doi: 10.1117/12.624341
Show Author Affiliations
M. Flemming, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
K. Roder, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
A. Duparré, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)


Published in SPIE Proceedings Vol. 5965:
Optical Fabrication, Testing, and Metrology II
Angela Duparré; Roland Geyl; Lingli Wang, Editor(s)

© SPIE. Terms of Use
Back to Top