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Proceedings Paper

Self-organized antireflective nanostructures on PMMA by ion etching
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Paper Abstract

Stochastic, self-organized nanostructures are produced by a low-pressure plasma treatment on the polymer polymethylmetacrylate (PMMA). The phenomena obtained by plasma treatment (structure formation and antireflective effect) are investigated regarding surface modifications, structure growth, and chemical modifications. Optically, the structure acts like a gradient layer with decreasing effective refractive index towards air, which is suitable for antireflection of PMMA.

Paper Details

Date Published: 20 October 2005
PDF: 9 pages
Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 59651N (20 October 2005); doi: 10.1117/12.623547
Show Author Affiliations
A. Kaless, Fraunhofer Institut Angewandte Optik und Feinmechanik (Germany)
U. Schulz, Fraunhofer Institut Angewandte Optik und Feinmechanik (Germany)
N. Kaiser, Fraunhofer Institut Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 5965:
Optical Fabrication, Testing, and Metrology II
Angela Duparré; Roland Geyl; Lingli Wang, Editor(s)

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