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Proceedings Paper

Construction and testing of wavefront reference sources for interferometry of ultra-precise imaging systems
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Paper Abstract

We have built and calibrated a set of 532-nm wavelength wavefront reference sources that fill a numerical aperture of 0.3. Early data show that they have a measured departure from sphericity of less than 0.2 nm RMS (0.4 milliwaves) and a reproducibility of better than 0.05 nm rms. These devices are compact, portable, fiber-fed, and are intended as sources of measurement and reference waves in wavefront measuring interferometers used for metrology of EUVL optical elements and systems. Keys to wave front accuracy include fabrication of an 800-nm pinhole in a smooth reflecting surface as well as a calibration procedure capable of measuring axisymmetric and non-axisymmetric errors.

Paper Details

Date Published: 18 August 2005
PDF: 10 pages
Proc. SPIE 5869, Optical Manufacturing and Testing VI, 58690P (18 August 2005); doi: 10.1117/12.623185
Show Author Affiliations
Michael A. Johnson, Lawrence Livermore National Lab. (United States)
Donald W. Phillion, Lawrence Livermore National Lab. (United States)
Gary E. Sommargren, Lawrence Livermore National Lab. (United States)
Todd A. Decker, Lawrence Livermore National Lab. (United States)
John S. Taylor, Lawrence Livermore National Lab. (United States)
Yoshio Gomei, Canon Inc. (Japan)
Osamu Kakuchi, Canon Inc. (Japan)
Seiji Takeuchi, Canon Inc. (Japan)

Published in SPIE Proceedings Vol. 5869:
Optical Manufacturing and Testing VI
H. Philip Stahl, Editor(s)

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