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Proceedings Paper

New optical setup for the generation of variable spot size on third generation synchrotron beamlines
Author(s): Thierry Moreno; Rachid Belkhou; Gilles Cauchon; Mourad Idir
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Paper Abstract

In third generation synchrotron radiation beamlines, a focussed X-ray beam is often employed. However, in some cases users need to modify their spot size in order to match the broad range of samples sizes. This is the case for XPEEM microscopy beamline which need a homogeneous beam with a spot size varying from 2 to 50 μm. These specifications requires that the beamline works out of focus, and in this case the spot becomes non homogenous (as already observed experimentally on several synchrotron beamlines). In this paper, we will explain, using a geometrical approach, that this effect on the spot is produced by mirrors slope errors. We propose a new optical solution that overcomes these difficulties. Our optical solution has been validated experimentally on the second branch of the Nanospectroscopy beamline at Elettra, where we have obtained homogenous spot sizes of 10, 20 and 30 μm with the same optical design.

Paper Details

Date Published: 16 September 2005
PDF: 7 pages
Proc. SPIE 5921, Advances in Metrology for X-Ray and EUV Optics, 59210F (16 September 2005); doi: 10.1117/12.622942
Show Author Affiliations
Thierry Moreno, Synchrotron Soleil (France)
Rachid Belkhou, Univ. Paris Sud (France)
Gilles Cauchon, Univ. Paris Sud (France)
Mourad Idir, Synchrotron Soleil (France)


Published in SPIE Proceedings Vol. 5921:
Advances in Metrology for X-Ray and EUV Optics
Lahsen Assoufid; Peter Z. Takacs; John S. Taylor, Editor(s)

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