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Proceedings Paper

Wide band laser-plasma soft X-ray source using a gas puff target for direct photo-etching of polymers
Author(s): Andrzej Bartnik; Henryk Fiedorowicz; Roman Jarocki; Jerzy Kostecki; Rafał Rakowski; Mirosław Szczurek
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Paper Abstract

Organic polymers (PMMA, PTFE, PET, and PI) are considered as the important materials in microengineering, especially for biological and medical applications. Micromachining of such materials is possible with the use of different techniques that involve electromagnetic radiation or charged particle beams. Another possibility of high aspect ratio micromachining of PTFE is direct photo-etching using synchrotron radiation. X-ray and ultraviolet radiation from other sources, for micromachining of materials by direct photo-etching can be also applied. In this paper we present the results of investigation of a wide band soft X-ray source and its application for direct photo-etching of organic polymers. X-ray radiation in the wavelength range from about 3 nm to 20 nm was produced as a result of irradiation of a double-stream gas puff target with laser pulses of energy 0.8 J and time duration of about 3 ns. The spectra, plasma size and absolute energies of soft X-ray pulses for different gas puff targets were measured. Photo-etching process of polymers irradiated with the use of the soft X-ray radiation was analyzed and investigated. Samples of organic polymers were placed inside a vacuum chamber of the x-ray source, close to the gas puff target at the distance of about 2 cm from plasmas created by focused laser pulses. A fine metal grid placed in front of the samples was used as a mask to form structures by x-ray ablation. The results of photo-etching process for several minutes exposition with l0Hz repetition rate were presented. High ablation efficiency was obtained with the use of the gas puff target containing xenon surrounded by helium.

Paper Details

Date Published: 12 October 2005
PDF: 9 pages
Proc. SPIE 5958, Lasers and Applications, 595815 (12 October 2005); doi: 10.1117/12.622119
Show Author Affiliations
Andrzej Bartnik, Military Univ. of Technology (Poland)
Henryk Fiedorowicz, Military Univ. of Technology (Poland)
Roman Jarocki, Military Univ. of Technology (Poland)
Jerzy Kostecki, Military Univ. of Technology (Poland)
Rafał Rakowski, Military Univ. of Technology (Poland)
Mirosław Szczurek, Military Univ. of Technology (Poland)


Published in SPIE Proceedings Vol. 5958:
Lasers and Applications
Krzysztof M. Abramski; Antonio Lapucci; Edward F. Plinski, Editor(s)

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