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Proceedings Paper

Feasibilty of modulated optical deflection sensing in atomic force microscopy
Author(s): Tuck Wah Ng; W. S. Lee; Osami Sasaki
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Paper Abstract

Optical deflection sensing is perhaps the most widely used scheme in atomic force microscopy. In this technique, the sensor is a quadrant photodiode. Position detection is essentially achieved using voltage differencing between the photodiode outputs. To improve data throughput, this is often done using operational amplifiers in the differencing mode. The measurement sensitivity is affected by environmental noise. Intensity modulation is a simple method of overcoming environmental noise. When this scheme is applied to the optical deflection sensor technique, random chaotic signals were found to form. Unless expensive filtering methods are introduced, the efficacy of using intensity modulation to reduce the effects of environmental noise in the optical deflection sensing method is limited.

Paper Details

Date Published: 12 April 2005
PDF: 6 pages
Proc. SPIE 5852, Third International Conference on Experimental Mechanics and Third Conference of the Asian Committee on Experimental Mechanics, (12 April 2005); doi: 10.1117/12.621749
Show Author Affiliations
Tuck Wah Ng, National Univ. of Singapore (Singapore)
W. S. Lee, Micron Semiconductor Asia Pte. Ltd. (Singapore)
Osami Sasaki, Niigata Univ. (Japan)


Published in SPIE Proceedings Vol. 5852:
Third International Conference on Experimental Mechanics and Third Conference of the Asian Committee on Experimental Mechanics
Chenggen Quan; Fook Siong Chau; Anand Asundi; Brian Stephen Wong; Chwee Teck Lim, Editor(s)

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