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Proceedings Paper

Application of a positioning and measuring machine for metrological long-range scanning force microscopy
Author(s): T. Hausotte; G. Jaeger; E. Manske; N. Hofmann; N. Dorozhovets
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Paper Abstract

This article deals with a high-precision three-dimensional positioning and measuring machine and its application as a metrological long-range scanning force microscope. At the Institute of Process Measurement and Sensor Technology of the Technische Universitaet Ilmenau an interferometric nanopositioning and nanomeasuring machine has been developed. Which is able to achieve a resolution of less than 0.1 nm over the entire positioning and measurement range of 25 mm x 25 mm x 5 mm and is traceable to the length standard. The Abbe offset-free design in conjunction with a corner mirror as a reference coordinate system provides extraordinary accuracy. The integration of several probe systems and nanotools (AFM, STM, focus sensor, tactile probes) makes the nanopositioning and nanomeasuring machine suitable for various tasks in the micro- and nanotechnologies. Various probe systems have been integrated in the last few years. For example, a commercial piezo tube AFM was integrated and tested. Additionally, interferometeric measurement systems of the nanopositioning and nanomeasuring machine enables the calibration of probe systems. Also in order to achieve the best possible measurement results special probe systems have been developed and tested and are discussed briefly.

Paper Details

Date Published: 30 August 2005
PDF: 12 pages
Proc. SPIE 5878, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II, 587802 (30 August 2005); doi: 10.1117/12.620882
Show Author Affiliations
T. Hausotte, Technische Universitaet Ilmenau (Germany)
G. Jaeger, Technische Universitaet Ilmenau (Germany)
E. Manske, Technische Universitaet Ilmenau (Germany)
N. Hofmann, Technische Universitaet Ilmenau (Germany)
N. Dorozhovets, Technische Universitaet Ilmenau (Germany)

Published in SPIE Proceedings Vol. 5878:
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II
Angela Duparre; Bhanwar Singh; Zu-Han Gu, Editor(s)

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