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Proceedings Paper

Multilayer coatings for the EUVL process development tool
Author(s): E. Louis; E. Zoethout; R. W. E. van de Kruijs; I. Nedelcu; A. E. Yakshin; S. Alonso van der Westen; T. Tsarfati; F. Bijkerk; H. Enkisch; S. Muellender
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Paper Abstract

Reported is a summary of the coating of three elements of the illuminator and three of the projection optics of the EUVL Process Development Tool. The coating process used is e-beam evaporation in combination with low energy ion beam smoothening. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 65% and the non correctable figure error that is added by the full multilayer stack is controlled to better than 15 picometer.

Paper Details

Date Published: 6 May 2005
PDF: 8 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.619856
Show Author Affiliations
E. Louis, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
E. Zoethout, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
R. W. E. van de Kruijs, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
I. Nedelcu, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
A. E. Yakshin, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
S. Alonso van der Westen, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
T. Tsarfati, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
F. Bijkerk, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
H. Enkisch, Carl Zeiss SMT AG (Germany)
S. Muellender, Carl Zeiss SMT AG (Germany)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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