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Proceedings Paper

A plane grating with single-layer coating for the sub-nanometer wavelength range
Author(s): Anna Bianco; Giovanni Sostero; Bruno Nelles; Klaus F. Heidemann; Daniele Cocco
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Paper Abstract

A diffraction plane grating with single-layer coating able to reach photon energy up to 3 keV (possibly 4 keV) will be adopted at the TwinMic beamline at ELETTRA. The TwinMic beamline will exploit the unique capabilities of the novel twin X-ray microscope, which combines scanning and full-field imaging microscopes in a single multipurpose end-station. The needed moderate energy resolving power will be provided by a variable included angle plane grating monochromator working in a collimated light mode (also known as collimated SX700). This configuration allows freely selection of the incidence and diffraction angles at the grating, therefore permitting, for instance, to optimize its efficiency. This monochromator uses two mechanically ruled gratings to cover a very wide working energy range. The first grating goes from 150 eV to 1000 eV while the second goes from 600 eV to 4 keV. The two gratings were ruled using the CARL ZEISS Grating Ruling Engine GTM6, which is operated under interferometric control. The high-energy plane grating, with a line density of 600 lines/mm, has a triangular profile with a blaze angle of 0.4° and an apex angle of 178°. The grating profile is ruled on a silicon substrate and is covered with a 30 nm thick gold film. The small blaze angle permits one to work in blaze condition at very grazing incidence angles and therefore allows reaching high photon energies not accessible by means of conventional gratings.

Paper Details

Date Published: 10 September 2005
PDF: 10 pages
Proc. SPIE 5918, Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II, 591810 (10 September 2005); doi: 10.1117/12.619232
Show Author Affiliations
Anna Bianco, Sincrotrone Trieste (Italy)
Giovanni Sostero, Sincrotrone Trieste (Italy)
Bruno Nelles, Carl Zeiss Laser Optics (Germany)
Klaus F. Heidemann, Carl Zeiss Laser Optics (Germany)
Daniele Cocco, Sincrotrone Trieste (Italy)

Published in SPIE Proceedings Vol. 5918:
Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II
George A. Kyrala; Jean-Claude J. Gauthier; Carolyn A. MacDonald; Ali M. Khounsary, Editor(s)

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