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Proceedings Paper

Reverse optimization of a Shack-Hartmann wavefront sensor
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Paper Abstract

Reverse optimization has been used in other metrology instruments to obtain good calibration results. This paper describes three approaches for using reverse optimization with a Shack-Hartmann wavefront sensor. Two of the approaches give some insight into problems encountered in reverse optimization and a third approach, involving an aberration function model of the Shack-Hartmann wavefront sensor, resolves these issues. Simulated results are given and the approach is shown to produce calibrated wavefront measurements accurate to one part in one thousand, in the presence of significant centroid noise.

Paper Details

Date Published: 19 August 2005
PDF: 6 pages
Proc. SPIE 5869, Optical Manufacturing and Testing VI, 586915 (19 August 2005); doi: 10.1117/12.618190
Show Author Affiliations
Daniel G. Smith, Nikon Research Corp. of America (United States)
John E. Greivenkamp, Univ. of Arizona College of Optical Sciences (United States)


Published in SPIE Proceedings Vol. 5869:
Optical Manufacturing and Testing VI
H. Philip Stahl, Editor(s)

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