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Proceedings Paper

High-performance large-area ultra-broadband (UV to IR) nanowire-grid polarizers and polarizing beam-splitters
Author(s): Jian Wang; Paul Sciortino; Feng Liu; Ping Yuan; Xuegong Deng; Frank Walters; Xiaoming Liu; Joel Bacon; Lei Chen
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Paper Abstract

Aluminum nanowire-grid polarizers and polarizing beam splitters with a fixed pitch (i.e., period) of ~146 nm but a wide range of linewidths (from < 60 nm to 90 nm) and heights (from 150 nm to 200 nm) are studied. Immersion interference lithography, UV-nanoimprint lithography and aluminum reactive ion etching were used to fabricate the nanowire-grid polarizers. Optical performance of the nanowire-grid polarizers was characterized in a broad spectral range from UV (< 400 nm) to near infrared (> 1700 nm). The performance trade-off between transmittance/reflectance and extinction ratio is investigated in details. The developed high-performance large-area broadband nanowire-grid polarizer opens the potential for many optical applications particularly integrated optics.

Paper Details

Date Published: 27 August 2005
PDF: 12 pages
Proc. SPIE 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II, 59310D (27 August 2005); doi: 10.1117/12.617898
Show Author Affiliations
Jian Wang, NanoOpto Corp. (United States)
Paul Sciortino, NanoOpto Corp. (United States)
Feng Liu, NanoOpto Corp. (United States)
Ping Yuan, NanoOpto Corp. (United States)
Xuegong Deng, NanoOpto Corp. (United States)
Frank Walters, NanoOpto Corp. (United States)
Xiaoming Liu, NanoOpto Corp. (United States)
Joel Bacon, NanoOpto Corp. (United States)
Lei Chen, NanoOpto Corp. (United States)


Published in SPIE Proceedings Vol. 5931:
Nanoengineering: Fabrication, Properties, Optics, and Devices II
Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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