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Proceedings Paper

Progress in quantum lithography
Author(s): Robert W. Boyd; Hye Jeong Chang; Heedeuk Shin; Colin O'Sullivan-Hale
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Paper Abstract

We review our progress toward implementing the proposal of Boto et al. (Phys. Rev. Lett. 85, 2733-2736, 2000) for using entangled photons to increase the spatial resolution of the process of interferometric photolithography beyond that of the standard Rayleigh limit.

Paper Details

Date Published: 15 September 2005
PDF: 4 pages
Proc. SPIE 5893, Quantum Communications and Quantum Imaging III, 58930G (15 September 2005); doi: 10.1117/12.617683
Show Author Affiliations
Robert W. Boyd, Institute of Optics, Univ. of Rochester (United States)
Hye Jeong Chang, Institute of Optics, Univ. of Rochester (United States)
Heedeuk Shin, Institute of Optics, Univ. of Rochester (United States)
Colin O'Sullivan-Hale, Institute of Optics, Univ. of Rochester (United States)


Published in SPIE Proceedings Vol. 5893:
Quantum Communications and Quantum Imaging III
Ronald E. Meyers; Yanhua Shih, Editor(s)

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