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Proceedings Paper

Improvement to silver superlens performance through narrowband exposure
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Paper Abstract

A performance enhancement to planar lens lithography (PLL) through the use of i-line narrowband exposures has been investigated. Experimental results show that for a 50nm silver layer the image fidelity of narrowband exposures out performs broadband exposures. This is due to the removal of off-plasmonic-resonance wavelengths, which cause unwanted background exposure and a loss of image fidelity. Dense gratings have been resolved down to 145nm periods, as well as line-pairs down to separation distances of 117nm. These results out perform the diffraction-limits that restrict traditional optical-system resolution limits.

Paper Details

Date Published: 26 August 2005
PDF: 9 pages
Proc. SPIE 5928, Plasmonic Nano-imaging and Nanofabrication, 592805 (26 August 2005); doi: 10.1117/12.617561
Show Author Affiliations
D. O. S. Melville, MacDiarmid Institute for Advanced Materials and Nanotechnology (New Zealand)
Univ. of Canterbury (New Zealand)
R. J. Blaikie, MacDiarmid Institute for Advanced Materials and Nanotechnology (New Zealand)
Univ. of Canterbury (New Zealand)
M. M. Alkaisi, MacDiarmid Institute for Advanced Materials and Nanotechnology (New Zealand)
Univ. of Canterbury (New Zealand)


Published in SPIE Proceedings Vol. 5928:
Plasmonic Nano-imaging and Nanofabrication
Satoshi Kawata; Vladimir M. Shalaev; Din Ping Tsai, Editor(s)

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