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Proceedings Paper

Implementation of an efficient defect classification methodology for advanced reticle inspection
Author(s): Paul Yu; Vincent Hsu; Ellison Chen; Rick Lai; Kong Son; Weimin Ma; Peter Chang; Jackie Chen
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Paper Abstract

As design rule continues to shrink towards ITRS roadmap requirements, reticle defect capture criteria are becoming ever more challenging. Pattern fidelity and reticle defects that were once perceived as insignificant or nuisance are now becoming a significant considerable yield impacting factor. More defects are also detectable and presented with increase in implementation of new generation reticle inspection systems. Therefore, how to review and characterize defects accurately and efficiently is becoming more significant. In particular, defect classification time often corresponds directly to the cost and the cycle time of mask manufacturing or new technology development. In this study we introduce a new mask defect review tool called ReviewSmart, which retrieves and processes defect images reported from KLA-Tencor's high sensitivity TeraScan inspection tool. Compared to the traditional defect review method, ReviewSmart provides a much better method to manage defects efficiently by utilizing the concept of defect grouping disposition. Through the application and qualification results with respectable reticle production cases, the implementation of ReviewSmart has been proven to be effective for reducing defect classification loading and improving defect characterizing efficiency. Moreover, the new review tool is helpful to categorically identify tool or process variations thus allowing users to expedite the learning process for developing production worthy leading node processes.

Paper Details

Date Published: 28 June 2005
PDF: 8 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617488
Show Author Affiliations
Paul Yu, KLA-Tencor Corp. (United States)
Vincent Hsu, KLA-Tencor Corp. (Taiwan)
Ellison Chen, KLA-Tencor Corp. (Taiwan)
Rick Lai, Taiwan Semiconductor Manufacturing Co. (Taiwan)
Kong Son, KLA-Tencor Corp. (United States)
Weimin Ma, KLA-Tencor Corp. (United States)
Peter Chang, Taiwan Semiconductor Manufacturing Co. (Taiwan)
Jackie Chen, Taiwan Semiconductor Manufacturing Co. (Taiwan)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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