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Proceedings Paper

Evaluation of quartz dry etching profile for the PSM lithography performance
Author(s): Toru Komizo; Satoru Nemoto; Yosuke Kojima; Takashi Ohshima; Takashi Yoshii; Toshio Konishi; Kazuaki Chiba; Yasutaka Kikuchi; Masao Otaki; Yoshimitsu Okuda
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Paper Abstract

The phase shift mask (PSM) is one of the most effective approaches to improve ArF lithography performance. Recently, the quartz dry etching technology plays an important role to fabricate the PSM, such as space bias type Alternating (Alt.) PSM and chrome-less phase lithography (CPL) mask. The quartz etching profiles seems to be affected the lithography performance. In this paper, preliminary, we evaluate the nominal influences of quartz profile by rigorous electromagnetic field simulation. Then influence of the quartz profile is investigated by measuring the real masks. In this experiment, we intentionally fabricate Alt. PSM and CPL masks with the tapered side-wall and deeper micro-trench. Lithography performances of the real masks are measured by the aerial image measurement system (AIMS fab193). We compare the result of AIMS with simulation. We investigate the AIMS measurement well corresponds to the simulation. Side-wall angle and corner rounding strongly affect the lithography performance. However, micro-trench doesn’t affect a lot.

Paper Details

Date Published: 28 June 2005
PDF: 11 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617440
Show Author Affiliations
Toru Komizo, Toppan Printing Co., Ltd. (Japan)
Satoru Nemoto, Toppan Printing Co., Ltd. (Japan)
Yosuke Kojima, Toppan Printing Co., Ltd. (Japan)
Takashi Ohshima, Toppan Printing Co., Ltd. (Japan)
Takashi Yoshii, Toppan Printing Co., Ltd. (Japan)
Toshio Konishi, Toppan Printing Co., Ltd. (Japan)
Kazuaki Chiba, Toppan Printing Co., Ltd. (Japan)
Yasutaka Kikuchi, Toppan Printing Co., Ltd. (Japan)
Masao Otaki, Toppan Printing Co., Ltd. (Japan)
Yoshimitsu Okuda, Toppan Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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