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Proceedings Paper

The unified mask data format based on OASIS for VSB EB writers
Author(s): Toshio Suzuki; Junji Hirumi; Yutaka Hojyo; Yuichi Kawase; Shinji Sakamoto; Koki Kuriyama; Syogo Narukawa; Morihisa Hoga
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Paper Abstract

We have developed a unified mask data format named “OASIS.VSB” for Variable-Shaped-Beam (VSB) EB writers. OASIS.VSB is the mask data format based on OASIS released as a successive format to GDSII by SEMI. We have defined restrictions on OASIS for VSB EB writers to input OASIS.VSB data directly to VSB EB writers just like the native EB data. We confirmed there was no large problem in OASIS.VSB as the unified mask data format through the evaluation results. The latest version of OASIS.VSB specification has been disclosed to the public in 2005.

Paper Details

Date Published: 28 June 2005
PDF: 8 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617423
Show Author Affiliations
Toshio Suzuki, Semiconductor Leading Edge Technologies, Inc. (Japan)
Junji Hirumi, Semiconductor Leading Edge Technologies, Inc. (Japan)
Yutaka Hojyo, Hitachi High-Technologies Co. (Japan)
Yuichi Kawase, JEOL Ltd. (Japan)
Shinji Sakamoto, NuFlare Technology Inc. (Japan)
Koki Kuriyama, Dai Nippon Printing Co., Ltd. (Japan)
Syogo Narukawa, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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