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Proceedings Paper

Improving OPC quality via interactions within the design-to-manufacturing flow
Author(s): Puneet Gupta; Andrew B. Kahng; C.-H. Park
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Paper Abstract

Today's design-manufacturing interface lacks essential mechanisms to link disparate disciplines and tool sets. In this paper, we describe three specific mechanisms for improving OPC quality via interactions within the design-to-manufacturing flow. Our studies of these improvements have yielded promising results.

Paper Details

Date Published: 28 June 2005
PDF: 10 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617372
Show Author Affiliations
Puneet Gupta, Blaze DFM Inc. (United States)
Andrew B. Kahng, Blaze DFM Inc. (United States)
Univ. of California/San Diego (United States)
C.-H. Park, Univ. of California/San Diego (United States)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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