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Proceedings Paper

Multilayer and multiproduct masks: cost reduction methodology
Author(s): Artur P. Balasinski
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Date Published:
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Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, ; doi: 10.1117/12.617361
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Artur P. Balasinski, Cypress Semiconductor Corp. (United States)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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