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Proceedings Paper

Second level exposure for phase shift mask applications using an SLM-based DUV mask writer
Author(s): Mahesh Chandramouli; Bob Olshausen; Yulia Korobko; Sven Henrichs; Ping Qu; Jian Ma; Bruce Auches; Damon Cole; Thomas Ostrom; Angela Beyerl; Robert Eklund; Raoul Zerne; Peter Goransson; Magnus Persson; Tom Newman
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Paper Abstract

Phase shift mask (PSM) applications are becoming essential for addressing the lithography requirements of the 65 nm technology node and beyond. Many mask writer properties must be under control to expose the second level of advanced PSM: second level alignment system accuracy, resolution, pattern fidelity, critical dimension (CD) uniformity and registration. Optical mask writers have the advantage of process simplicity for this application, as they do not require a discharge layer. This paper discusses how the mask writer properties affect the error budget for printing the second level. A deep ultraviolet (DUV) mask writer with a spatial light modulator (SLM) is used in the experimental part of the paper. Partially coherent imaging optics at the 248 nm wavelength provide improved resolution over previous systems, and pattern fidelity is optimized by a real-time corner enhancement function. Lithographic performance is compared to the requirements for second level exposure of advanced PSM. The results indicate sufficient capability and stability for 2nd level alternating PSM patterning at the 65 nm and 45 nm nodes.

Paper Details

Date Published: 28 June 2005
PDF: 10 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617359
Show Author Affiliations
Mahesh Chandramouli, Intel Corp. (United States)
Bob Olshausen, Intel Corp. (United States)
Yulia Korobko, Intel Corp. (United States)
Sven Henrichs, Intel Corp. (United States)
Ping Qu, Intel Corp. (United States)
Jian Ma, Intel Corp. (United States)
Bruce Auches, Intel Corp. (United States)
Damon Cole, Intel Corp. (United States)
Thomas Ostrom, Micronic Laser Systems AB (Sweden)
Angela Beyerl, Micronic Laser Systems AB (Sweden)
Robert Eklund, Micronic Laser Systems AB (Sweden)
Raoul Zerne, Micronic Laser Systems AB (Sweden)
Peter Goransson, Micronic Laser Systems AB (Sweden)
Magnus Persson, Micronic Laser Systems AB (Sweden)
Tom Newman, Micronic Laser Systems AB (Sweden)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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