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Proceedings Paper

Second level printing of advanced phase shift masks using DUV laser lithography
Author(s): Charles Howard; Keun-Taek Park; Marcus Scherer; Svetomir Stankovic; Rusty Cantrell; Mark Herrmann
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Paper Abstract

Laser lithography tools have been a staple in the photomask industry for second level printing for several years. This paper explores the overlay capabilities of the Alta4300D Deep UV (DUV) lithography system. The tool is manufactured by ETEC Systems, a part of the Mask Business Group of Applied Materials. The tool demonstrates good overlay performance, and an improved data path ensures the ability to handle large file sizes without an adverse impact on writing time. In addition to actual performance data on product masks, a simple analysis of the maximum total edge placement error of a hypothetical two level alt-PSM process is presented. The results show the tool is capable for many advanced phase shift overlay applications.

Paper Details

Date Published: 28 June 2005
PDF: 10 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617357
Show Author Affiliations
Charles Howard, DuPont Photomasks, Inc. (United States)
Keun-Taek Park, DuPont Photomasks, Inc. (United States)
Marcus Scherer, Advanced Mask Technology Ctr. GmbH and Co. KG (Germany)
Svetomir Stankovic, Advanced Mask Technology Ctr. GmbH and Co. KG (Germany)
Rusty Cantrell, Advanced Mask Technology Ctr. GmbH and Co. KG (Germany)
Mark Herrmann, Advanced Mask Technology Ctr. GmbH and Co. KG (Germany)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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