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Proceedings Paper

Growth of anatase TiO2 thin films by laser ablation
Author(s): Nadya E. Stankova; Petar A. Atanasov; Anna O. Dikovska; Ivan G. Dimitrov; Gabriel Socol; Ion N. Mihailescu
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Paper Abstract

Thin TiO2 films were grown on (001) SiO2 substrates using excimer KrF laser ablation of ceramic targets. The influence of deposition temperatures at fixed oxygen pressure of 10 Pa on the crystal and optical properties of the films was investigated. Structural characterisation by X-ray diffraction and Raman spectroscopy shows preferential crystallization of the anatase TiO2 films were obtained at high temperatures of 500 and 600 °C, respectively. Optical transmission as high as 92% in the visible spectral region was measured for films grown at temperatures higher than 400 °C. The refractive index and the thickness of the films measured by m-line spectroscopy shows the highest values of 2/41 and 250 nm, respectively, at deposition temperature of 600 °C.

Paper Details

Date Published: 22 April 2005
PDF: 5 pages
Proc. SPIE 5830, 13th International School on Quantum Electronics: Laser Physics and Applications, (22 April 2005); doi: 10.1117/12.617327
Show Author Affiliations
Nadya E. Stankova, Institute of Electronics (Bulgaria)
Petar A. Atanasov, Institute of Electronics (Bulgaria)
Anna O. Dikovska, Institute of Electronics (Bulgaria)
Ivan G. Dimitrov, Institute of Electronics (Bulgaria)
Gabriel Socol, National Institute for Lasers, Plasma and Radiation Physics (Romania)
Ion N. Mihailescu, National Institute for Lasers, Plasma and Radiation Physics (Romania)


Published in SPIE Proceedings Vol. 5830:
13th International School on Quantum Electronics: Laser Physics and Applications
Peter A. Atanasov; Sanka V. Gateva; Lachezar A. Avramov; Alexander A. Serafetinides, Editor(s)

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