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Proceedings Paper

A prospective modular platform of the mask pattern automatic inspection using the die-to-database method
Author(s): Syarhei Avakaw; Aliaksandr Korneliuk; Alena Tsitko
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Paper Abstract

The paper presents a description of a new modular automatic reticle defect inspection platform and also a description of one of the main elements of this platform - a defect detection sub-system. This platform is currently under active development at Planar Concern. This paper presents the results of the use of the object-oriented approach which was used in the development of the defect detection algorithms for the die-to-database reticle inspection system. Furthermore, the paper presents briefly the architecture and technology of the new modular automatic reticle inspection platform.

Paper Details

Date Published: 28 June 2005
PDF: 12 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617305
Show Author Affiliations
Syarhei Avakaw, Planar State Scientific and Production Concern for Precision Machine-Building (Belarus)
Aliaksandr Korneliuk, Planar State Scientific and Production Concern for Precision Machine-Building (Belarus)
Alena Tsitko, Planar State Scientific and Production Concern for Precision Machine-Building (Belarus)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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