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Proceedings Paper

Aerial image based mask defect detection in dense array structures
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Paper Abstract

For leading mask technologies the mask inspection for finding critical defects is always a difficult task. With the introduction of chrome-less, high-transmission and alternating mask types, new absorber material and the possibility of quartz defects the defect inspection and -classification becomes even more challenging. To decide whether a defect is critical or a repair is successful, the Zeiss AIMS tool is used to classify defects. For conventional imaging the optical settings are usually chosen such that resolution is maximized, for example a dipole illumination is used for imaging a dense line-space array at an optimum contrast. In this paper we will do the opposite and reduce the optical resolution, such that we can filter out the array pattern and study the resulting defect image. This technique allows using a simple threshold detector to find and classify defects.

Paper Details

Date Published: 28 June 2005
PDF: 12 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617303
Show Author Affiliations
Roderick Kohle, Infineon Technologies AG (Germany)
Mario Hennig, Infineon Technologies SC 300 GmbH and Co. OHG (Germany)
Rainer Pforr, Infineon Technologies SC 300 GmbH and Co. OHG (Germany)
Karsten Bubke, Advanced Mask Technology Ctr. (Germany)
Martin Sczyrba, Advanced Mask Technology Ctr. (Germany)
Arndt C. Durr, Advanced Mask Technology Ctr. (Germany)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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