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Proceedings Paper

Experimental analysis of image placement accuracy of single-membrane masks for LEEPL
Author(s): Minoru Kitada; Yuuki Aritsuka; Satoshi Yusa; Naoko Kuwahara; Hiroshi Fujita; Tadahiko Takikawa; Hisatake Sano; Morihisa Hoga
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Paper Abstract

We have fabricated seven masks with different patterns on a 27 mm x 34 mm single-membrane for Low Energy Electron-beam Proximity Lithography (LEEPL) by the wafer-flow process. We have examined the membrane flatness and image placement (IP) accuracy, which are essential qualities to be assured. We summarize the results as follows: Masks with membranes of 13 MP and 20MPa stress satisfy the membrane flatness requirement of less than 2 μm while a mask with a 6 MPa membrane does not. Maps of the distortion induced by the wafer-flow process are obtained for the masks with 13 MPa and 20 MPa membranes and their performance is explained in terms of the contraction of the mask substrate. The out-of-plane distortion for a 3 mm x 3 mm block of dense hole patterns with an opening ratio, ranging from 10% to 40%, has been evaluated. The distortion induced by the block has been evaluated and the effect of the local magnification correction on the IP error is examined. Maps of the distortion induced by the wafer-flow process and 4 x 4 blocks of 10% and 20% opening are obtained for a mask with 13 MPa membrane and the distortion induced by the blocks is estimated in 3σ. The uncorrectable IP error for the mask with the blocks of 10% opening is estimated to be 10 nm (in 3σ), which satisfies the specification for LEEPL masks.

Paper Details

Date Published: 28 June 2005
PDF: 12 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617290
Show Author Affiliations
Minoru Kitada, Dai Nippon Printing Co., Ltd. (Japan)
Yuuki Aritsuka, Dai Nippon Printing Co., Ltd. (Japan)
Satoshi Yusa, Dai Nippon Printing Co., Ltd. (Japan)
Naoko Kuwahara, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Fujita, Dai Nippon Printing Co., Ltd. (Japan)
Tadahiko Takikawa, Dai Nippon Printing Co., Ltd. (Japan)
Hisatake Sano, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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