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Proceedings Paper

Comparison of various EUV masks
Author(s): Christelle Charpin-Nicolle; Jean François Damlencourt; Jean Yves Robic; Roland Blanc
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Date Published:
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Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, ; doi: 10.1117/12.617270
Show Author Affiliations
Christelle Charpin-Nicolle, CEA (France)
Jean François Damlencourt, CEA (France)
Jean Yves Robic, CEA (France)
Roland Blanc, STMicroelectronics (France)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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