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Proceedings Paper

Flexible sparse and dense OPC algorithms
Author(s): Nick Cobb
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Paper Abstract

In this paper, we distinguish between sparse and dense simulation. We give a background on known sparse and dense simulation techniques. We propose a new “semi-dense” OPC technique which is between standard sparse, and fully dense OPC. We also discuss a fully dense OPC algorithm, in which full image grids are used to control the OPC corrections. Finally, we discuss dense verification to ensure good printing behavior through process window on the full image.

Paper Details

Date Published: 28 June 2005
PDF: 10 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617198
Show Author Affiliations
Nick Cobb, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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