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Proceedings Paper

Photomask pattern viewer and analyzer: HOTSCOPE
Author(s): Shogo Narukawa; Kiyoshi Yamasaki; Yuji Machiya; Naoya Hayashi
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Paper Abstract

Recently, photomask pattern feature have become different from LSI layout pattern feature by the OPC process and CMP DUMMY pattern insertion. And then, photomask pattern data volume is very large compared with LSI layout pattern data volume. Therefore, in the usual JOBDECK pattern viewer software, it is difficult to draw those huge pattern data smoothly and quickly. Moreover, various proposals of RET (Resolution Enhancement Technology) are made from various companies and organizations, and it is discussed by various societies. According to the RET, mask pattern feature and structure have been more complicated than the present pattern, and mask difficulty and mask cost might be going to increase and will have great anxiety. Photomask pattern viewer, HOTSCOPE which we developed isn't an only high speed photomask pattern viewer and analyzer, but also can superpose and observe some other mask format pattern and GDS2 format pattern by changing pattern magnification and mirror processing by itself. And HOTSCOPE is the tool which fully incorporated the function required for mask manufactures, such as a plan of a mask, preparation of JOBDECK, and the mask pattern analysis purpose.

Paper Details

Date Published: 28 June 2005
PDF: 8 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617155
Show Author Affiliations
Shogo Narukawa, Dai Nippon Printing Co., Ltd. (Japan)
Kiyoshi Yamasaki, Dai Nippon Printing Co., Ltd. (Japan)
Yuji Machiya, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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