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Proceedings Paper

Evaluation of mask data preparation with OASIS and P10
Author(s): Koki Kuriyama; Yuji Machiya; Kiyoshi Yamasaki; Shogo Narukawa; Naoya Hayashi
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Paper Abstract

OASIS (Open Artwork System Interchange Standard) is the new stream format to replace conventional GDSII and has become a SEMI standard 2003. Also, some EDA software tools already support OASIS. OASIS can apply not only layout design field but also photomask industory. OASIS is effective to reduce data volume even if it is a fractured data, therefore it is expected to solve file size explosion problem. From mask manufacturer's perspective, it is also necessary to consider mask layout information. In present, there are various kinds of layout information and jobdeck formats. These circumstances require complicated data handling and preparation process at the mask manufacturers. Computerized automatic process needs to be more utilized to eradicate mistakes and miscommunications at the planning department. SEMI standard P10 (Specification of Data Structures for Photomask Orders) is one of the solutions. P10 is basically intended to communicate about mask order data which include layout information. This paper reports the result of evaluation of mask data preparation unified with two SEMI standards: P39 (OASIS) and P10. We have developed a reticle pattern viewer (HOTSCOPE) which can view photomask data with combined OASIS with P10. Figure 1 shows connection between mask data formats, which include OASIS and P10 format with our reticle pattern viewer. HOTSCOPE provides reviewing mask data as a photomask image. It will interface between device manufacturers and mask manufacturers.

Paper Details

Date Published: 28 June 2005
PDF: 8 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617151
Show Author Affiliations
Koki Kuriyama, Dai Nippon Printing Co., Ltd. (Japan)
Yuji Machiya, Dai Nippon Printing Co., Ltd. (Japan)
Kiyoshi Yamasaki, Dai Nippon Printing Co., Ltd. (Japan)
Shogo Narukawa, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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