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Proceedings Paper

Effectiveness of mask data process using OASIS format
Author(s): Katsuji Tabara; Mitsuo Sakurai; Seiji Makino; Takahisa Itoh; Tomoyuki Okada
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Paper Abstract

OASIS(Open Artwork System Interchange Standard) format was investigated for various logic device datas. In this investigation, the change in the processing time of the confirmation of the content of compression in OASIS and the mask data processing were confirmed. OASIS format has higher data compressibility than other methods, and its compressibility is independent on the data size. It is very effective in a advanced technology device according to the above-nentioned investigations. In data storage and data handling, applying after OPC processing is quite effective.

Paper Details

Date Published: 28 June 2005
PDF: 7 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617148
Show Author Affiliations
Katsuji Tabara, Fujitsu Ltd. (Japan)
Mitsuo Sakurai, Fujitsu Ltd. (Japan)
Seiji Makino, Fujitsu Ltd. (Japan)
Takahisa Itoh, Fujitsu Ltd. (Japan)
Tomoyuki Okada, Fujitsu Ltd. (Japan)

Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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