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Proceedings Paper

Photomask lifetime issues in ArF lithography
Author(s): Florence Eschbach; Peter Coon; Barbara Greenebaum; Anurag Mittal; Peter Sanchez; Daniel Tanzil; Grace Ng; Henry Yun; Archita Sengupta
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Paper Abstract

Photomask lifetime has become a challenge since the introduction of high volume manufacturing 193nm photolithograph. Photomask lifetime is being impacted by a broad range of environmental and process factors resulting in inorganics crystals and organic contaminants formation as well as pellicle lifetime issues. Extensive work has been published on strategies for reduction of inorganic crystals photoinduced defects formation mainly focusing on photomask clean process improvements. This paper will focus on identifying root causes for photoinduced contaminants forming within the pellicle space area as well as identify environmental factors which have the potential of impacting pellicle membrane longevity. Outgasing experiments coupled with 193nm laser exposure tests were conducted to decouple and rank reticle/pellicle storage materials as well as pellicle outgasing contributors to photoinduced defects and identify factors impacting pellicle membrance longevity. Analytical test were conducted to compare the relative levels of reticle storage materials and pellicle outgasing contaminants. Experiments aimed at quantifying the fab environment contribution to photoinduced defects formation and impact on pellicle membrane lifetime will be discussed. Environmental conditions minimizing external contributing factors impacting photomask front side photoinduced defects formation and pellicle membrance longevity will be suggested.

Paper Details

Date Published: 28 June 2005
PDF: 9 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617078
Show Author Affiliations
Florence Eschbach, Intel Corp. (United States)
Peter Coon, Intel Corp. (United States)
Barbara Greenebaum, Intel Corp. (United States)
Anurag Mittal, Intel Corp. (United States)
Peter Sanchez, Intel Corp. (United States)
Daniel Tanzil, Intel Corp. (United States)
Grace Ng, Intel Corp. (United States)
Henry Yun, Intel Corp. (United States)
Archita Sengupta, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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