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Proceedings Paper

Validation of Nu-Flare e-beam emulation software in a simulation environment
Author(s): Daniel Ritter; Peter Brooker; John Lewellen; Young-Mog Ham; Patrick Martin; Rand Cottle
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Paper Abstract

In order to reduce mask making costs and improve wafer printability it is advantageous to determine machine parameters that will create highest probability of successful mask yield and mask image at CD and inspection. Proper simulation of actual product database helps to define the optimum e-beam machine settings for maximum probable yield and best mask pattern including OPC structures. In this paper we study the basic capability of the Nu-Flare E-beam mask writer emulation taking into account mask processing effects such as PEB. Analysis of how well software emulates the actual PEC corrections applied in the mask writer is necessary in predicting proper initial and subsequent machine settings for optimum yield and OPC structure fidelity. Comparisons of the Nu-Flare PEC emulation against actual mask PEC patterns on chrome masks are presented. Excellent agreement is found to experimental data when the PEC algorithm is modified to keep dose to the dense line pattern constant for any given setting of the eta PEC parameter.

Paper Details

Date Published: 28 June 2005
PDF: 6 pages
Proc. SPIE 5853, Photomask and Next-Generation Lithography Mask Technology XII, (28 June 2005); doi: 10.1117/12.617060
Show Author Affiliations
Daniel Ritter, Sigma-C GmbH (Germany)
Peter Brooker, Sigma-CAD, Inc. (United States)
John Lewellen, Sigma-CAD, Inc. (United States)
Young-Mog Ham, Photronics, Inc. (United States)
Patrick Martin, Photronics, Inc. (United States)
Rand Cottle, Photronics, Inc. (United States)

Published in SPIE Proceedings Vol. 5853:
Photomask and Next-Generation Lithography Mask Technology XII
Masanori Komuro, Editor(s)

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