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Proceedings Paper

Elements of capillary optics applied in the spectral range between 10 and 15 nm
Author(s): J. Tümmler; H. Stiel; H. Legall; R. Bruch; A. A. Bjeoumikhov; N. Langhoff; K. A. Janulewicz; G. Priebe; P. V. Nickles
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Paper Abstract

Technological reasons stimulated enormous interest in the spectral range between 10 nm and 15 nm. One of the most important, apart from the potential to be applied in the microlithography, was the existence of the high-efficiency, spectrally highly selective (narrow-band) reflective multi-layer (ML) optics in this spectral range. Applying these optics to plasma based XUV (extreme ultra violett) sources the debris from the plasma is a serious problem. For transmissive multi-layer optics we have additionally the low figures of merit. For example, the best beam splitters have an efficiency of about 30% (energy in both parts of the splitted beam). This type of element is crucial for efficient single-shot interferometry being the main application using table-top soft x-ray lasers. We applied capillary optical elements, to our knowledge for the first time, to XUV radiation at 13.9 nm. These optical elements help overcome the limits discussed above or at least remarkably reduce the existing difficulties. A capillary beam splitter and a focussing capillary were applied to an incoherent XUV radiation source. For the beam splitter we measured a throughput of about 80%. With the focussing capillary we obtained a spot size of 27 μm (FWHM) with a gain (intensity in the focal spot compared to the intensity behind a pinhole of the focal spot size) of 600. Advantages and disadvantages of these optics in the discussed spectral range are analyzed.

Paper Details

Date Published: 12 September 2005
PDF: 8 pages
Proc. SPIE 5919, Soft X-Ray Lasers and Applications VI, 59190F (12 September 2005); doi: 10.1117/12.617053
Show Author Affiliations
J. Tümmler, Max-Born-Institut (Germany)
H. Stiel, Max-Born-Institut (Germany)
H. Legall, Max-Born-Institut (Germany)
R. Bruch, Univ. of Nevada Reno (United States)
A. A. Bjeoumikhov, Institute for Scientific Instruments GmbH (Germany)
N. Langhoff, Institute for Scientific Instruments GmbH (Germany)
K. A. Janulewicz, Max-Born-Institut (Germany)
G. Priebe, Max-Born-Institut (Germany)
P. V. Nickles, Max-Born-Institut (Germany)

Published in SPIE Proceedings Vol. 5919:
Soft X-Ray Lasers and Applications VI
Ernst E. Fill, Editor(s)

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