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Proceedings Paper

Enhanced performance of EUV multilayer coatings
Author(s): E. Louis; A. E. Yakshin; E. Zoethout; R. W. E. van de Kruijs; I. Nedelcu; S. Alonso van der Westen; T. Tsarfati; F. Bijkerk; H. Enkisch; S. Müllender; B. Wolschrijn; B. Mertens
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Paper Abstract

Reported is a summary of the development of EUV Mo/Si multilayer coating technology. Though the results are developed for application in Extreme Ultraviolet Lithography, they are of a broader relevance including optics for astronomy. The coating process used consists of electron beam evaporation in combination with low energy ion beam smoothening. The radiation hardness of these coatings is discussed and methods to reduce the multilayer induced substrate stress. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 65%, while the non correctable figure error added by the full multilayer stack is controlled to better than 15 picometer.

Paper Details

Date Published: 10 September 2005
PDF: 4 pages
Proc. SPIE 5900, Optics for EUV, X-Ray, and Gamma-Ray Astronomy II, 590002 (10 September 2005); doi: 10.1117/12.616902
Show Author Affiliations
E. Louis, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
A. E. Yakshin, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
E. Zoethout, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
R. W. E. van de Kruijs, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
I. Nedelcu, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
S. Alonso van der Westen, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
T. Tsarfati, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
F. Bijkerk, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
H. Enkisch, Carl Zeiss SMT AG (Germany)
S. Müllender, Carl Zeiss SMT AG (Germany)
B. Wolschrijn, TNO TPD (Netherlands)
B. Mertens, TNO TPD (Netherlands)


Published in SPIE Proceedings Vol. 5900:
Optics for EUV, X-Ray, and Gamma-Ray Astronomy II
Oberto Citterio; Stephen L. O'Dell, Editor(s)

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