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Proceedings Paper

Comparisons between EUV at-wavelength metrological methods
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Paper Abstract

Comparisons between several at-wavelength metrological methods are reported. The comparisons are performed by measuring one test optic with several kinds of measurement methods from the viewpoints of accuracy, precision and practicality. According to our investigation, we found that the PDI, the LDI, and the CGLSI are the most suitable methods for evaluating optics for EUV lithography.

Paper Details

Date Published: 17 September 2005
PDF: 8 pages
Proc. SPIE 5921, Advances in Metrology for X-Ray and EUV Optics, 59210D (17 September 2005); doi: 10.1117/12.616676
Show Author Affiliations
Katsumi Sugisaki, EUVA Sagamihara R&D Ctr. (Japan)
Masashi Okada, EUVA Sagamihara R&D Ctr. (Japan)
Yucong Zhu, EUVA Sagamihara R&D Ctr. (Japan)
Katsura Otaki, EUVA Sagamihara R&D Ctr. (Japan)
Zhiqiang Liu, EUVA Sagamihara R&D Ctr. (Japan)
Jun Kawakami, EUVA Sagamihara R&D Ctr. (Japan)
Mikihiko Ishii, EUVA Sagamihara R&D Ctr. (Japan)
Jun Saito, EUVA Sagamihara R&D Ctr. (Japan)
Katsuhiko Murakami, EUVA Sagamihara R&D Ctr. (Japan)
Masanobu Hasegawa, EUVA Utsunomiya R&D Ctr. (Japan)
Chidane Ouchi, EUVA Utsunomiya R&D Ctr. (Japan)
Seima Kato, EUVA Utsunomiya R&D Ctr. (Japan)
Takayuki Hasegawa, EUVA Utsunomiya R&D Ctr. (Japan)
Akiyoshi Suzuki, EUVA Utsunomiya R&D Ctr. (Japan)
Hideo Yokota, EUVA Utsunomiya R&D Ctr. (Japan)
Masahito Niibe, Univ. of Hyogo (Japan)
Mitsuo Takeda, Univ. of Electro-Communications (Japan)


Published in SPIE Proceedings Vol. 5921:
Advances in Metrology for X-Ray and EUV Optics
Lahsen Assoufid; Peter Z. Takacs; John S. Taylor, Editor(s)

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