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Proceedings Paper

Research and development of MEMS x-ray optics
Author(s): Yuichiro Ezoe; Kazuhisa Mitsuda; Makoto Mita; Masaki Koshiishi; Yoshitaka Ishisaki; Keisuke Shinozaki; Akio Hoshino
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Paper Abstract

Development of a new light-weight and low-cost micro pore optics is reported. Utilizing anisotropic chemical wet etching of MEMS (Micro Electro Mechanical System) technology, a number of smooth sidewalls are obtained at once. These sidewalls are potential X-ray mirrors. As a first step of R&D, basic characters of sidewalls such as surface roughness and X-ray reflectivity are experimentally studied. Rms-roughness of 10 ~ 20Å is confirmed in a KOH-etched wafer. Furthermore, the X-ray reflection is for the first time detected at Mg Kα 1.25 keV. Based on the obtained results, numerical simulations of four-stage MEMS X-ray optics are performed for future satellite mission.

Paper Details

Date Published: 8 September 2005
PDF: 10 pages
Proc. SPIE 5900, Optics for EUV, X-Ray, and Gamma-Ray Astronomy II, 590013 (8 September 2005); doi: 10.1117/12.616517
Show Author Affiliations
Yuichiro Ezoe, Japan Aerospace Exploration Agency (Japan)
Kazuhisa Mitsuda, Japan Aerospace Exploration Agency (Japan)
Makoto Mita, Japan Aerospace Exploration Agency (Japan)
Masaki Koshiishi, Japan Aerospace Exploration Agency (Japan)
Yoshitaka Ishisaki, Tokyo Metropolitan Univ. (Japan)
Keisuke Shinozaki, Tokyo Metropolitan Univ. (Japan)
Akio Hoshino, Tokyo Metropolitan Univ. (Japan)


Published in SPIE Proceedings Vol. 5900:
Optics for EUV, X-Ray, and Gamma-Ray Astronomy II
Oberto Citterio; Stephen L. O'Dell, Editor(s)

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