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Proceedings Paper

Developments of nanoimprint technologies and applications
Author(s): Takashi Ando; Kosuke Kuwabara; Chiseki Haginoya; Masahiko Ogino; Kenya Ohashi; Akihiro Miyauchi
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Paper Abstract

The nanoimprint technology is attractive for the fabrication of nano-scale structures in view of cost and mass production. There are several points for the industrial applications such as pattern formation area, resolution, residual layer thickness, precise control of pattern transfer, lifetime of mold, alignment and so on. A thermal nanoimprint system, which can imprint fine dots on a 300 mm diameter wafer in a single step, is developed. The narrow pith patterns for future storage and IT devices are formed on a polymer layer. A high-aspect nanoprint (Hi-NP) technology forms polymer nanopillars with high aspect ratio. The nanopillars are applied to a bio-chip for the fluorescence immunoassay. The chip is effective in the enhancement of the fluorescence intensities, since the nanopillars enlarge the surface area.

Paper Details

Date Published: 27 August 2005
PDF: 8 pages
Proc. SPIE 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II, 59310B (27 August 2005); doi: 10.1117/12.616384
Show Author Affiliations
Takashi Ando, Hitachi, Ltd. (Japan)
Kosuke Kuwabara, Hitachi, Ltd. (Japan)
Chiseki Haginoya, Hitachi, Ltd. (Japan)
Masahiko Ogino, Hitachi, Ltd. (Japan)
Kenya Ohashi, Hitachi, Ltd. (Japan)
Akihiro Miyauchi, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 5931:
Nanoengineering: Fabrication, Properties, Optics, and Devices II
Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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