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Proceedings Paper

Integrated nano-optic devices based on immersion nano-gratings made by imprint lithography and nano-trench-filling technology
Author(s): Jian Wang; Xuegong Deng; Paul Sciortino; Ron Varghese; Anguel Nikolov; Feng Liu; Xiaoming Liu; Lei Chen
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Paper Abstract

Nano-optic retarders and polarizers based on dielectric and metal nano-gratings were fabricated by UV-nanoimprint lithography. Different from conventional nanostructure-based optical devices, atomic layer deposition, a highly uniform and conformal deposition process, were utilized to fill trenches of the both dielectric and metal nano-gratings. The resulted immersion nano-grating design opens a path for innovative nano-grating based optical devices and integrated optical devices. As an example, a high-performance fully-buried aluminum nanowire-gird polarizer was developed which allowed us to achieve a monolithically integrated visible circular polarizer. The ability to integrate multiple nanostructure-based optical layers opens a path for innovative integrated optical devices as well as a new strategy for driving both miniature and cost.

Paper Details

Date Published: 27 August 2005
PDF: 12 pages
Proc. SPIE 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II, 59310C (27 August 2005); doi: 10.1117/12.615951
Show Author Affiliations
Jian Wang, NanoOpto Corp. (United States)
Xuegong Deng, NanoOpto Corp. (United States)
Paul Sciortino, NanoOpto Corp. (United States)
Ron Varghese, NanoOpto Corp. (United States)
Anguel Nikolov, NanoOpto Corp. (United States)
Feng Liu, NanoOpto Corp. (United States)
Xiaoming Liu, NanoOpto Corp. (United States)
Lei Chen, NanoOpto Corp. (United States)


Published in SPIE Proceedings Vol. 5931:
Nanoengineering: Fabrication, Properties, Optics, and Devices II
Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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