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Proceedings Paper

Micromachining of organic polymers by direct photo-etching using a compact laser plasma soft x-ray source
Author(s): H. Fiedorowicz; A. Bartnik; R. Jarocki; J. Kostecki; R. Rakowski; M. Szczurek
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Paper Abstract

The results of experiments on micromachining of organic polymers by direct photo-etching using a compact laser plasma soft X-ray source based on a gas puff target are presented. Soft X-ray radiation in the wavelength range from 2 to 15 nm was produced as a result of irradiation of a double-stream gas puff target with 0.8 J/3 ns laser pulses from a Nd:YAG laser. The soft X-ray pulses with energy of about 100-200 mJ in a single pulse were used to irradiate samples from organic polymers to form microstructures. The obtained results show that direct photo-etching using the laser plasma soft X-ray source could be useful for micromachining of organic polymers. Strong enhancement of the photo-etching process was observed for the samples heated up to 140oC.

Paper Details

Date Published: 27 August 2005
PDF: 5 pages
Proc. SPIE 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II, 59310H (27 August 2005); doi: 10.1117/12.615890
Show Author Affiliations
H. Fiedorowicz, Military Univ. of Technology (Poland)
A. Bartnik, Military Univ. of Technology (Poland)
R. Jarocki, Military Univ. of Technology (Poland)
J. Kostecki, Military Univ. of Technology (Poland)
R. Rakowski, Military Univ. of Technology (Poland)
M. Szczurek, Military Univ. of Technology (Poland)


Published in SPIE Proceedings Vol. 5931:
Nanoengineering: Fabrication, Properties, Optics, and Devices II
Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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