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Proceedings Paper

Uncertainties in aspheric profile measurements with the geometry measuring machine at NIST
Author(s): Ulf Griesmann; Nadia Machkour-Deshayes; Johannes Soons; Byoung Chang Kim; Quandou Wang; John R. Stoup; Lahsen Assoufid
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Paper Abstract

The Geometry Measuring Machine (GEMM) of the National Institute of Standards and Technology (NIST) is a profilometer for free-form surfaces. A profile is reconstructed from local curvature of a test part surface, measured at several locations along a line. For profile measurements of free-form surfaces, methods based on local part curvature sensing have strong appeal. Unlike full-aperture interferometry they do not require customized null optics. The uncertainty of a reconstructed profile is critically dependent upon the uncertainty of the curvature measurement and on curvature sensor positioning. For an instrument of the GEMM type, we evaluate the measurement uncertainties for a curvature sensor based on a small aperture interferometer and then estimate the uncertainty in the reconstructed profile that can be achieved. In addition, profile measurements of a free-form mirror, made with GEMM, are compared with measurements using a long-trace profiler, a coordinate measuring machine, and subaperture-stitching interferometry.

Paper Details

Date Published: 18 August 2005
PDF: 13 pages
Proc. SPIE 5878, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II, 58780D (18 August 2005); doi: 10.1117/12.615398
Show Author Affiliations
Ulf Griesmann, National Institute of Standards and Technology (United States)
Nadia Machkour-Deshayes, National Institute of Standards and Technology (United States)
Johannes Soons, National Institute of Standards and Technology (United States)
Byoung Chang Kim, National Institute of Standards and Technology (United States)
Quandou Wang, National Institute of Standards and Technology (United States)
John R. Stoup, National Institute of Standards and Technology (United States)
Lahsen Assoufid, Argonne National Lab. (United States)


Published in SPIE Proceedings Vol. 5878:
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II
Angela Duparre; Bhanwar Singh; Zu-Han Gu, Editor(s)

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