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Proceedings Paper

Compact source and beam delivery system for EUV radiation using a Schwarzschild objective
Author(s): K. Mann; F. Barkusky; A. Bayer; C. Peth; H. Toettger; T. Feigl; N. Kaiser
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Paper Abstract

In order to generate high energy densities of 13.5 nm radiation, an EUV Schwarzschild mirror objective with a numerical aperture of 0.44 and a demagnification of 10 was developed and adapted to a compact laser-based EUV source. The spherical mirror substrates were coated with Mo/Si multilayers systems. With a single mirror reflectance of more than 65% the total transmittance of the Schwarzschild objective exceeds 40 % at 13.5 nm. From the properties of the EUV source (pulse energy 3 mJ at 13.5 nm, plasma diameter approx. 300 μm), energy densities of 73 mJ/cm2 at a pulse length of 6 ns can be estimated in the image plane of the objective. As a first application, the formation of color centers in lithium fluoride crystals by EUV radiation was investigated. F2, F3 and F3+ color centers could be identified by absorption spectroscopy. The formation dynamics was studied as a function of the EUV dose. By imaging of a pinhole positioned behind the plasma, an EUV spot of 5 μm diameter was generated, which accomplishes direct writing of color centers with μm resolution.

Paper Details

Date Published: 31 August 2005
PDF: 15 pages
Proc. SPIE 5918, Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II, 59180F (31 August 2005); doi: 10.1117/12.614989
Show Author Affiliations
K. Mann, Laser-Lab. Goettingen e.V. (Germany)
F. Barkusky, Laser-Lab. Goettingen e.V. (Germany)
A. Bayer, Laser-Lab. Goettingen e.V. (Germany)
C. Peth, Laser-Lab. Goettingen e.V. (Germany)
H. Toettger, Laser-Lab. Goettingen e.V. (Germany)
T. Feigl, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
N. Kaiser, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 5918:
Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II
George A. Kyrala; Jean-Claude J. Gauthier; Carolyn A. MacDonald; Ali M. Khounsary, Editor(s)

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