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Proceedings Paper

The network structure of the merit function space of EUV mirror systems
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Paper Abstract

The merit function space of mirror systems for EUV lithography is studied. Local minima situated in a multidimensional merit function space are connected via links that contain saddle points and form a network. In this work we present the first networks for EUV lithographic objectives and discuss how these networks change when control parameters, such as aperture and field are varied and constraints are used to limit the variation domain of the variables. A good solution in a network obtained with a limited number of variables has been locally optimized with all variables to meet practical requirements.

Paper Details

Date Published: 26 August 2005
PDF: 8 pages
Proc. SPIE 5874, Current Developments in Lens Design and Optical Engineering VI, 587402 (26 August 2005); doi: 10.1117/12.614862
Show Author Affiliations
Oana Marinescu, Delft Univ. of Technology (Netherlands)
Florian Bociort, Delft Univ. of Technology (Netherlands)


Published in SPIE Proceedings Vol. 5874:
Current Developments in Lens Design and Optical Engineering VI
Pantazis Z. Mouroulis; Warren J. Smith; R. Barry Johnson, Editor(s)

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