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Proceedings Paper

Rapid fabrication of large area photonic crystals containing arbitrary defects by combining the interference and multi-photon polymerization techniques
Author(s): Ngoc Diep Lai; Wen Ping Liang; Jian Hung Lin; Chia Chen Hsu
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Paper Abstract

We demonstrate a promising method to fabricate large-area photonic crystals with desired defects by using the combination of interference and multi-photon polymerization techniques. Multiple-exposure of two-beam interference pattern at 325 nm into a negative SU-8 photopolymerizable photoresist is used to form a square or hexagonal twodimensional periodic structure. Arbitrary defects are introduced in these structures by tightly focused (numerical aperture 0.85) 100 fs duration pulses at 830 nm to generate multi-photon polymerization effect. The experimental evidence of 6 mm × 6 mm photonic crystals with the lattice constant as small as 1 μm embedding several kinds of defect proves the concept and shows this technique potentially useful for photonic researches and applications.

Paper Details

Date Published: 27 August 2005
PDF: 8 pages
Proc. SPIE 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II, 593108 (27 August 2005); doi: 10.1117/12.614821
Show Author Affiliations
Ngoc Diep Lai, National Chung Cheng Univ. (Taiwan)
Wen Ping Liang, National Chung Cheng Univ. (Taiwan)
Jian Hung Lin, National Chung Cheng Univ. (Taiwan)
Chia Chen Hsu, National Chung Cheng Univ. (Taiwan)


Published in SPIE Proceedings Vol. 5931:
Nanoengineering: Fabrication, Properties, Optics, and Devices II
Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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