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Proceedings Paper

Characterization of extreme ultraviolet (EUV) emission from xenon generated using a compact plasma-discharge source for lithography applications
Author(s): H. Merabet; R. Bista; C. Schubert; S. Fuelling; R. Bruch; A. L. Godunov
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Paper Abstract

In this work we have studied the generation of Extreme Ultraviolet (EUV) light by a novel Compact Electron Cyclotron Resonance Ion Source (CECRIS). The EUV emission diagnostics of the ECR plasma was accomplished by means of a 1.5 m Grazing Incidence Monochromator which was operated in a wavelength range of 4-90 nm under the condition of medium to high resolution to discriminate between spectra arising from different Xeq+ (q = 1-10) charge states. One of the major accomplishments of this study is assignment of numerous new optical transitions for Xenon in the 10-80 nm range under absolute conditions to create a database for further investigations. High resolution spectra were recorded confirming fair contributions from highly excited Xe10+ and Xe9+ ionic states. Major outcome of this work is that the Xe10+ ion emission with λ = 13.4 nm may occurs with such a simplified and compact ECR source. The EUV emission of this particular line is of great interest for lithography applications.

Paper Details

Date Published: 31 August 2005
PDF: 12 pages
Proc. SPIE 5918, Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II, 59180E (31 August 2005); doi: 10.1117/12.613983
Show Author Affiliations
H. Merabet, Dhofar Univ. (Oman)
Univ. of Nevada Reno (United States)
R. Bista, Univ. of Nevada Reno (United States)
C. Schubert, Univ. of Nevada Reno (United States)
S. Fuelling, Univ. of Nevada Reno (United States)
R. Bruch, Univ. of Nevada Reno (United States)
A. L. Godunov, Old Dominion Univ. (United States)


Published in SPIE Proceedings Vol. 5918:
Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II
George A. Kyrala; Jean-Claude J. Gauthier; Carolyn A. MacDonald; Ali M. Khounsary, Editor(s)

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